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Tác giả CN
| PARANDAMAN,A |
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Nhan đề
| Kinetics of the thermal decomposition of tetramethylsilane behind the reflected shock waves between 1058 and 1194 K |
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Nguồn trích
| Journal of chemical sciences2016
Số: 4
Tập: 28 |
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| 000 | 00000nab#a2200000ui#4500 |
|---|
| 001 | 24156 |
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| 002 | 6 |
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| 004 | F4407AE4-D528-49A6-B165-10F90ECADCD7 |
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| 005 | 201812181433 |
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| 008 | 081223s vm| vie |
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| 009 | 1 0 |
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| 039 | |y20181218143359|zcuonglv |
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| 041 | 0 |avie |
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| 100 | |aPARANDAMAN,A |
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| 245 | |aKinetics of the thermal decomposition of tetramethylsilane behind the reflected shock waves between 1058 and 1194 K |
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| 773 | |tJournal of chemical sciences|d2016|v28|i4 |
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| 890 | |c1|a0|b0|d1 |
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